Day 3: Wednesday 12 September: Processing-induced defects and Defect Engineering

09.00-10.00: Defects in wafer thermal processing (Gudrun Kissinger)
10.00-10.30: coffee break
10.30-11.30: Ion-implantation induced defects (Marie-Luisa Polignano)
11.30-12.30: Metal contacts and conformal coating technology (Christophe Detavernier)
12.30-14.00: lunch
14.00-15.00: Isolation-induced defects (Rita Rooyackers)
15.00-16.00: Processing-induced metal contamination (Marie-Luisa Polignano)
16.00-16.30: coffee break
16.30-17.30: Defect passivation and gettering (Gudrun Kissinger)
17.30-19.00: Student poster session